Modeling and robust optimization of grinding and polishing parameters of support casing
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摘要:
针对支承机匣内孔磨抛表面质量难以保证及磨抛效率低问题，开展了磨抛工艺参数对表面质量影响研究。基于Preston理论建立了螺旋式磨抛材料去除量方程，理论上揭示了螺旋式磨抛工艺参数对表面质量的影响规律。通过正交实验进行方差灵敏度分析，探寻出打磨轮目粒度、打磨轮进给速度、打磨轮转速和抛光时间等影响因子对材料去除率和表面粗糙度影响规律及贡献率，在此基础上以材料去除率和表面粗糙度为优化研究目标，构建了基于Kriging响应面近似模型的稳健优化设计数学模型，采用粒子群算法进行计算求解，计算出2611组优化解。结合实际工程要求，最佳的工艺参数为目粒度1400目、进给速度3 mm/s、转速3600 r/min、抛光时间9 min，为磨抛工程领域的工艺质量改善提供技术支撑。
Abstract:Considering the difficulty of guaranteeing the surface quality of grinding and polishing of the inner hole of the support casing and the low grinding and polishing efficiency, the research on the influence of grinding and polishing process parameters on the surface quality was carried out. Based on Preston's theory, the material removal equation of spiral grinding and polishing was established, and the influence law of spiral grinding and polishing process parameters on surface quality was theoretically revealed. The variance sensitivity analysis was carried out through orthogonal experiments, and the influencing factors such as grinding wheel particle size, grinding wheel feed speed, grinding wheel rotation speed and polishing time on the material removal rate and roughness were found out. On this basis, taking the material removal rate and roughness as the optimization research objectives, a robust optimization design mathematical model based on the Kriging response surface approximation model was constructed, and the particle swarm algorithm was used for calculation and solving, bringing about 2611 sets of optimization solutions. Combined with practical engineering requirements, the optimal process parameters include target particle size 1400, feed speed 3 mm/s, rotational speed 3600 r/min, and polishing time 9 min, providing a technical support for the improvement of process quality in the field of grinding and polishing engineering.
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图 7 主因子与输出响应拟合响应面
Figure 7. Principal factors fitting response surfaces to output responses
表 1 设计空间
Table 1. Design space
设计变量 X1/目 X2/（mm/s） X3/（r/min） X4/min 下限 400 2 1000 5 上限 2 000 3.5 4000 20 
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表 2 工艺参数水平表
Table 2. Process parameters level table
水平 $ {X}_{1} $/目 $ {X}_{2} $/（mm/s） $ {X}_{3} $/（r/min） $ {X}_{4} $/min 1 400 2 1000 5 2 800 2.5 2 000 10 3 1200 3 3000 15 4 2 000 3.5 4000 20
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表 3 实验结果
Table 3. Test results
序号 X1/目 X2/（mm/s） X3/（r/min） X4/min Y1/
（μm/min）Y2/
μm1 1 1 1 1 0.191 0.150 2 1 2 2 2 1.794 0.130 3 1 3 3 3 2.010 0.104 4 1 4 4 4 2.850 0.108 5 2 1 2 3 0.288 0.080 6 2 2 1 4 0.569 0.091 7 2 3 4 1 3.476 0.088 8 2 4 3 2 4.239 0.103 9 3 1 3 4 0.080 0.025 10 3 2 4 3 0.490 0.027 11 3 3 1 2 0.531 0.021 12 3 4 2 1 0.782 0.026 13 4 1 4 2 0.119 0.019 14 4 2 3 1 0.252 0.022 15 4 3 2 4 0.410 0.020 16 4 4 1 3 0.425 0.018
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